
U.S. Production of Thin-Film Lithium Niobate Wafers Supporting Defense & Commercial Photonics
G&H and Raytheon are establishing a new US manufacturing capability for thin-film lithium niobate (TFLN) wafers.

G&H (LON: GHH) is featured in the July/August 2026 edition of Semiconductor Digest in an article examining the growing commercial importance of thin-film lithium niobate, or TFLN.
Written by Dr Stratos Kehayas, President of the G&H Photonics Division, the feature explores how TFLN is moving beyond laboratory demonstrations and specialist defence applications to become an increasingly important material platform for integrated photonics.
Entitled “TFLN: A Material Platform Reaches an Inflection Point,” the article considers how TFLN compares with established silicon photonics and indium phosphide technologies. It also examines the combination of high bandwidth, low drive voltage and minimal modulation-induced heating that could make TFLN particularly valuable for next-generation photonic systems.
The Semiconductor Digest article highlights opportunities for TFLN across AI data-centre interconnects, co-packaged optics, secure communications, defence systems and quantum photonics. It also discusses the importance of manufacturing readiness, wafer quality and the development of a secure and scalable TFLN supply chain.


