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From crystal growth, crystal orientation and cutting, to waveplate fabrication and coating, no other waveplate supplier has as much control over the fabrication stages as G&H.
Our waveplates been used in the cutting edge of research at Lawrence Livermore National Laboratory’s NIF project to the most demanding of production environments in semiconductor metrology equipment.
For all wavelength ranges, we orient, cut, and polish the optical crystals for waveplate production. Tight internal controls enable better retardation tolerances within and between production runs.
waveplate_graphic Polishing, coating, assembly, and metrology complete the manufacturing process.
Compound zero-order (also known as net-zero order) and achromatic waveplates are often optically contacted to reduce reflection losses at the surfaces. Air-spacing is recommended for high energy applications. Speciality waveplate designs such as off-axis or true-zero order waveplates are produced to custom specifications.

Waveplates from the UV to the NIR

From crystal orientation to assembled product, we produce cutting-edge waveplates for a varied range of applications and customers.
  • Crystal Quartz – standard material for UV-NIR waveplate applications
  • LiNbO3 – infrequently used in 1.5 ?m applications and optical frequency shifters
  • MgF2 – typically used in combination with Crystal Quartz for achromatic waveplates
  • Mica – for ophthalmology applications
  • Sapphire – for defense applications in extreme environmental conditions
  • YVO4 – waveplates for the 400 nm to 5 ?m ranges

Waveplates for the IR, higher energies, or larger formats

As the world's only entirely vertically integrated CdS, CdSe, and KDP waveplate producer, we deliver accurate performance for demanding applications. Our control over crystal growth benefits customers who need larger sizes, high laser damage threshold performance, or more accurate retardation tolerances.


Aerospace, astronomy, biomedical, laser power control and attenuation, military, optical isolation, polarimetry, remote sensing, semiconductor metrology, spectroscopy, surveillance.
Visible  & NIRSpecificationsUV, VIS, NIR Multiple Order, Net-Zero, DualUV, VIS, NIR AchromaticUV, VIS, NIR High Energy
Substrate materialCrystal QuartzCrystal Quartz & MgF2KDP or KD*P
Sizes5 mm to150 mm5 mm to 50 mm5 mm to 430 mm
High surface quality10-540-20 typical10-5 < 20 mm 20-10 < 430 mm
Retardation toleranceλ/500 at 23°Cat633 nm?/72at 23°C
Operating conditions10 J/cm2, 20 ns pulse, 20 Hz10 J/cm2,10 ns pulseat 1064 nm
Transmitted wavefrontλ/10 at 633 nmλ/10 at 633 nm?/6at 633 nm
InfraredSpecifications*IR multiple ordersingle wavelength (3µm- 12µm)??IR Net zero orderNarrow range (3µm- 12µm)Achromatic  3-5µm, 5-8 µm, or 8-12 µm
Substrate materialCdS or CdSeCdS/CdS or CdSe/CdSeCdS/CdSe
Sizes4mm to 29mm4mm to 29mm4mm to 29mm
Retardation?tolerance± 5° at design wavelength± 5° at design wavelength± 10°
Transmission>97% at design wavelength>90% at center wavelength>90% at center wavelength
*custom wavelength ranges available
G&H has received IS09001 certification across all of its manufacturing facilities. AS9100C certification has been achieved at select facilities.