Custom Reticles
G&H Custom-designed optical reticles with sub-micron precision for alignment, targeting, metrology, and imaging across photonics, defense, and semiconductor industries.
Full Product DescriptionProduct description
G&H Custom Reticles are engineered to meet exacting optical alignment, calibration, and targeting requirements in the most demanding environments. Manufactured to your requirements using advanced photolithographic or microlithographic processes, our reticles offer sub-micron feature resolution and exceptional pattern accuracy on high-quality optical substrates such as fused silica or borosilicate glass.
We offer complete design flexibility—supporting crosshairs, dots, grids, micrometer scales, fiducials, concentric circles, and more—tailored to your specific optical system. Whether you require metallic, etched, etched & filled, or dichroic patterns, our custom reticles can be optimized for transmission or reflection, multi-wavelength visibility, and mechanical or thermal resilience.
Used globally in defense sighting systems, semiconductor lithography tools, photonics labs, and industrial inspection systems, G&H custom reticles deliver unmatched precision, durability, and performance.
Applications
- Precision targeting and sighting systems
- Laser rangefinding and optical alignment
- Reticles for military-grade scopes and optics
- Rugged optical systems for harsh environments
- Wafer alignment and photomask calibration
- Reticles for lithography inspection and metrology
- Reference standards in cleanroom production
- Nanometer-scale measurement tools
- Beam profiling and interferometer alignment
- Optical system calibration and axis alignment
- Custom fiducials for advanced optical setups
- Laser alignment targets in lab and industrial systems
Key features
- Fully Customizable Designs - Patterns tailored to customer specifications, including crosshairs, grids, dots, fiducials, micrometer scales, and complex geometries.
- Sub-Micron Patterning Accuracy - Advanced photolithographic and microlithographic processes enable resolutions down to 0.25 µm with exceptional line edge definition.
- Multiple Fabrication Options - Available in metallic, etched, etched & filled, and dichroic formats to suit application-specific contrast, durability, and spectral requirements.
- Optically Clear Substrates - Manufactured on fused silica, borosilicate glass, or quartz for low distortion and high thermal stability.
- Durable Coatings - Options for chrome, 'black' chrome, aluminum, or dielectric coatings, with protective overcoats (e.g., SiO₂) and anti-reflective (AR) options available.
- High Contrast & Visibility - Designed for use in transmission or reflection, offering excellent visibility under visible, IR, or laser illumination.
- Wide Format Range - Supported in sizes from Ø6 mm to Ø150 mm, with substrate thicknesses from 0.5 mm to 6 mm.
- Rugged and Reliable - Built for long-term performance in lab, field, or cleanroom environments, with excellent resistance to temperature, humidity, and handling.
- Multimarket Applications - Designed for use in defense optics, semiconductor inspection, laser alignment, machine vision, and advanced photonic systems.
| Feature | Etch & Fill Reticles | Crosshair Reticles | Dot Reticles | Metallic Reticles | Dichroic Reticles |
|---|---|---|---|---|---|
| Pattern Visibility | High Contrast (filled pattern) | Visible lines or wires | High-contrast dots | Opaque metal patterns | Wavelength dependent |
| Typical Applications | Calibration, alignment, metrology | Targeting, alignment, centering | Centering, fiducials, laser alignment | Imaging, calibration, defense optics | IR alignment, HUD, covert sighting |
| Durability | Very high (epoxy-filled) | High | High | Very high | Extremely high |
| Patterning Method | Etching + epoxy fill | Photolithography or wire | Photolithography or etch/fill | Photolithography or metal | Dielectric interference coating |
| Material Contrast | White fill on glass | Chrome or etched lines | Chrome or filled dots | Chrome, AI, Au | Spectral interference |
| Substrate Material | Borosilicate, Fused Silica | Borosilicate, Fused Silica | Borosilicate, Fused Silica | Borosilicate, Fused Silica | Fused Silica, BK7 |
| Customizable Patterns | Yes | Yes | Yes | Yes | Yes |
| Spectral Selectivity | No | No | No | No | Yes |
| Common Coatings | AR, Chrome | AR, Chrome | AR, Chrome | AR, Chrome, Dielectric | AR, Dielectric |
