Metallic Reticles

G&H’s metallic reticles, manufactured using advanced microlithographic processing, deliver sub-micron patterning precision for critical optical applications across defense, semiconductor, and photonics industries. These high-accuracy reticles are fabricated on optically flat substrates such as fused silica or borosilicate glass and patterned with durable metallic layers—typically chrome, 'black' chrome, aluminum, or custom, for excellent contrast, edge definition, and longevity.

In defense applications, they provide rugged, high-contrast targeting and alignment capabilities in laser-based systems, weapon sights, and optical scopes designed for harsh environments. For the semiconductor sector, these reticles serve as critical alignment references, calibration standards, and inspection targets for wafer steppers, photomask systems, and metrology tools—ensuring repeatable accuracy in nanometer-scale processes. In photonics and advanced optics, they are essential for beam profiling, interferometer calibration, and high-resolution optical system alignment.

Customizable in pattern type, line width, and coating, G&H metallic reticles combine durability, optical clarity, and nanometer-level precision to support the most demanding optical performance requirements across industries.

Applications

• Precision targeting and sighting systems
• Laser rangefinding and optical alignment
• Reticles for military-grade scopes and optics
• Rugged optical systems for harsh environments
• Wafer alignment and photomask calibration
• Reticles for lithography inspection and metrology
• Reference standards in cleanroom production
• Nanometer-scale measurement tools
• Beam profiling and interferometer alignment
• Optical system calibration and axis alignment
• Custom fiducials for advanced optical setups
• Laser alignment targets in lab and industrial systems