Etch & Fill Reticles
The G&H etch & fill reticles are precision-manufactured glass substrates used primarily in the semiconductor, photonics, and optics industries for critical alignment, calibration, and imaging tasks.
Full Product DescriptionProduct description
These reticles feature high-contrast patterns created through a photolithographic process where a pattern is etched into a chrome or metal-coated glass surface and then filled with a contrasting material (typically white epoxy or a reflective compound) to enhance visibility under various lighting conditions.
This method allows for long-lasting, durable marks that are resistant to wear, making Etch & Fill reticles ideal for repeated use in environments requiring high accuracy.
Applications
- Optical alignment and calibration
- Microscopy stage calibration
- Metrology tools and inspection systems
- Wafer positioning systems
- Photolithography alignment tools
Key features
- High Durability: Filled etchings resist abrasion, contamination, and chemical exposure better than printed patterns.
- High Contrast: Ideal for machine vision systems and optical alignment due to enhanced contrast between filled and non-filled areas.
- Submicron Precision: Fabrication tolerances down to ±0.5 µm or better.
- Customizable Patterns: Grid layouts, crosshairs, fiducials, logos, alignment marks, etc.
- Surface Types: Anti-reflective or coated glass to suit transmission or reflection requirements.
| Optical Specification | |
|---|---|
| Flatness | λ/2 (Irregularity: λ/4) |
| Pattern centration | < .002” |
| Line widths | 0.0001” (0.0025mm) |
| General tolerances | Per MIL-PRF-13830 |
| Coatings | Per MIL-C-675, MIL-C-14806, MIL-F48616 |
| Mechanical Specification | |
|---|---|
| Diameter range | 5 - 75mm |
| Materials | Silica, B270, BK-7, N-SK11 |
| Bonding | Per MIL-A-3920 |
| Manufacturing | Per MIL-F-13926 |
| Environmental Specification | |
|---|---|
| Testing | Per MIL-C-675, MIL-C-14806, MIL-STD-810 |